Publications

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Base T, Bastl Z, Havranek V, et al. Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces. Langmuir. 2012;28. Available at: http://pubs.acs.org/doi/abs/10.1021%2Fla302334x.
Jana A, Jash M, Dar WAhmed, et al. Carborane-thiol protected copper nanoclusters: Stimuli-responsive materials with tunable phosphorescence. Chemical Science. 2023;14:1613-1626. Available at: https://pubs.rsc.org/en/content/articlelanding/2023/sc/d2sc06578a.
Jana A, Jash M, Dar WA, et al. Carborane-thiol protected copper nanoclusters: Stimuli-responsive materials with tunable phosphorescence . Chemical Science. Available at: https://pubs.rsc.org/en/content/articlelanding/2023/sc/d2sc06578a.
Jana A, Unnikrishnan PM, Poonia AK, et al. Carboranethiol-Protected Propeller-Shaped Photoresponsive Silver Nanomolecule. Inorganic Chemistry. 2022;61:8593−8603. Available at: https://pubs.acs.org/doi/10.1021/acs.inorgchem.2c00186.
Base T, Bastl Z, Havranek V, Machacek J, Malina V. Carboranethiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces, or a Novel Class of Etchants?. European Materials Research Society, Spring Meeting. 2012. e-mrs_springmeeting_2012_t_base_poster.pdf (646.88 KB) e-mrs_springeeting_2012_t_base_abstract.pdf (16.55 KB)
Base T, Bastl Z, Havranek V, et al. Carborane-thiol-silver interactions. A comparative study of the molecular protection of silver surfaces. Surface and Coatings Technology. 2010;204. Available at: http://www.sciencedirect.com/science/article/pii/S0257897210001106.
Base T, Bastl Z, Londesborough MGS, Machacek J. A comparison of boron hydride- and hydrocarbon-based thiol derivatives assembled on gold surfaces. NSTI Nanotechnology Conference and Trade Show. 2008;1. Available at: http://www.nsti.org/procs/Nanotech2008v1/2/T35.902.
White KE, Avery EM, Cummings E, et al. Competing Intermolecular and Molecule–Surface Interactions: Dipole–Dipole-Driven Patterns in Mixed Carborane Self-Assembled Monolayers. Chemistry of Materials. 2024;36:2085-2095. Available at: https://pubs.acs.org/doi/10.1021/acs.chemmater.3c03210.