TY - JOUR T1 - Competing Intermolecular and Molecule–Surface Interactions: Dipole–Dipole-Driven Patterns in Mixed Carborane Self-Assembled Monolayers JF - Chemistry of Materials Y1 - 2024 A1 - Katherine E. White A1 - Erin M. Avery A1 - Edison Cummings A1 - Zixiang Hong A1 - Jens Langecker A1 - Aliaksei Vetushka A1 - Michal Dusek A1 - Jan Machacek A1 - Jakub Višnák A1 - Jan Endres A1 - Zdenek Bastl A1 - Ersen Mete A1 - Anastassia N. Alexandrova A1 - Tomas Base A1 - Paul S. Weiss KW - 2D assembly KW - boron KW - carborane KW - Cluster Molecules KW - Dipole-dipole KW - Molecular interactions KW - Molecular structure KW - scanning tunneling microscopy KW - Supramolecular chemistry AB -

Carboranedithiol isomers adsorbing with opposite orientations of their dipoles on surfaces are self-assembled together to form mixed monolayers where both lateral dipole–dipole and lateral thiol–thiolate (S–H···S) interactions provide enhanced stability over single-component monolayers. We demonstrate the first instance of the ability to map individual isomers in a mixed monolayer using the model system carboranedithiols on Au{111}. The addition of methyl groups to one isomer provides both an enhanced dipole moment and extra apparent height for differentiation via scanning tunneling microscopy (STM). Associated computational investigations rationalize favorable interactions of mixed pairs and the associated stability changes that arise from these interactions. Both STM images and Monte Carlo simulations yield similarly structured mixed monolayers, where approximately 10% of the molecules have reversed dipole moment orientations but no direct chemical attachment to the surface, leading to homogeneous monolayers with no apparent phase separation. Deprotonating the thiols by depositing the molecules under basic conditions eliminates the lateral S–H···S interactions while accentuating the dipole–dipole forces. The molecular system investigated is composed of isomeric molecules with opposite orientations of dipoles and identical surface packing, which enables the mapping of individual molecules within the mixed monolayers and enables analyses of the contributions of the relatively weak lateral interactions to the overall stability of the assemblies.

VL - 36 UR - https://pubs.acs.org/doi/10.1021/acs.chemmater.3c03210 ER - TY - JOUR T1 - Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces JF - Langmuir Y1 - 2012 A1 - Tomas Base A1 - Zdenek Bastl A1 - Vladimir Havranek A1 - Jan Machacek A1 - Jens Langecker A1 - Vaclav Malina AB -

Two different positional isomers of 1,2-dicarbacloso-dodecaboranedithiols, 1,2-(HS)2-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been investigated as cluster building blocks for self-assembled monolayers (SAMs) on copper surfaces. These two isomers represent a convenient system in which the attachment of SH groups at different positions on the skeleton affects their acidic character and thus also determines their reactivity with a copper surface. Isomer 1 exhibited etching of polycrystalline Cu films, and a detailed investigation of the experimental conditions showed that both the acidic character of SH groups and the presence of oxygen at the copper surface play crucial roles in how the surface reaction proceeds: whether toward a self-assembled monolayer or toward copper film etching. We found that each positional isomer requires completely different conditions for the preparation of a SAM on copper surfaces. Optimized conditions for the former isomer required the exposure of a freshly prepared Cu surface to vapor of 1 in vacuum, which avoided the presence of oxygen and moisture. Adsorption from a dichloromethane solution afforded a sparsely covered Cu(0) surface; isomer 1 effectively removes the surface copper(I) oxide, forming a soluble product, but apparently binds only weakly to the clean Cu(0) surface. In contrast, adsorption of the latter, less volatile isomer proceeded better from a dichloromethane solution than from the vapor phase. Isomer 2 was even able to densely cover the copper surface cleaned up by the dichloromethane solution of 1. Both isomers exhibited high capacity to remove oxygen atoms from the surface copper(I) oxide that forms immediately after the exposure of freshly prepared copper films to ambient atmosphere. Isomer 2 showed suppression of Cu film oxidation. A number of methods including X-ray photoelectron spectroscopy (XPS), X-ray Rutherford back scattering (RBS), proton-induced X-ray emission (PIXE) analysis, atomic force microscopy (AFM), cyclic voltammetry, and contact angle measurements were used to investigate the experimental conditions for the preparation of SAMs of both positional isomers on copper surfaces and to shed light on the interaction between these molecules and a polycrystalline copper surface.

VL - 28 UR - http://pubs.acs.org/doi/abs/10.1021%2Fla302334x ER - TY - Generic T1 - Carboranethiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces, or a Novel Class of Etchants? T2 - European Materials Research Society, Spring Meeting Y1 - 2012 A1 - Tomas Base A1 - Zdenek Bastl A1 - Vladimir Havranek A1 - Jan Machacek A1 - Vaclav Malina AB -

This contribution aims at showing an unprecedented behavior of carboranedithiols on copper surfaces. Two different positional isomers of 1,2-dicarba-closo-dodecaborane-dithiol, 1,2-(HS)2-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been used as a convenient molecular system in which the attachment of -SH groups at different positions on the skeleton affects their acidic character and thus determines their reactivity with a copper surface. While the latter isomer represents a weak acid and forms a self-assembled monolayer (SAM) similarly to various aliphatic and aromatic thiols reported previously, the former isomer shows etching of copper leading to a complete dissolution of the films used in our experiments at a rate of approx. 70 nm per hour (in 7.5 mM EtOH solution of 1 at 20 C). A detailed investigation of the experimental conditions showed that the acidic character of -SH groups and the presence of oxygen at the copper surface play crucial role in how the surface reaction proceeds: whether towards the formation of a 1-SAM or towards etching and dissolution of a copper film. Reaction between 1 and a freshly prepared copper surface in vacuum or in a dry and oxygen-free solvent such as toluene, or dichloromethane yields a 1-SAM. This study shows the first thiol derivative that possesses the ability to etch copper films. A number of methods including XPS, RBS, PIXE have been used and the results will be presented and discussed. Acknowledgement: P205/10/0348, GACR

 

JF - European Materials Research Society, Spring Meeting PB - E-MRS CY - Strasbourg, France, 2012 May 14-18 ER - TY - JOUR T1 - Carborane-thiol-silver interactions. A comparative study of the molecular protection of silver surfaces JF - Surface and Coatings Technology Y1 - 2010 A1 - Tomas Base A1 - Zdenek Bastl A1 - Vladimir Havranek A1 - Kamil Lang A1 - Jonathan Bould A1 - Michael G S Londesborough A1 - Jan Machacek A1 - Jaromir Plesek AB -

The interaction between flat silver surfaces and carboranethiol derivatives, and its relevance regarding the molecular protection of silver against corrosion by hydrogen sulphide, are reported here. A comparison of the protective qualities of four carboranethiols (1-HS-1,2-C2B10H11, 1,2-(HS)2-1,2-C2B10H10, 9,12-(HS)2-1,2-C2B10H10, and 1,12-(HS)2-1,2-C2B10H10) with several organic thiols (1-butanethiol, 1-octanethiol, 1-dodecanethiol, benzene-1,2-dithiol, benzenethiol, and sodium 2-mercaptoethanesulphonate) is provided. All these derivatives are categorized according to their capacity to inhibit the interaction of silver with H2S in the presence of water molecules in the gas phase. We found that significantly better molecular protection for silver surfaces is afforded by the carboranethiol derivatives, and, of these, 9,12-(HS)2-1,2-C2B10H10 proved to be particularly effective. The corrosion of silver by H2S is accompanied by well-defined colour changes from lustrous silver, through yellow, violet, blue, and finally to grey. This sequence has not been reported before and it is used in this study as a qualitative indicator of the extent of silver corrosion. Our results are supported by reflectance UV

VL - 204 UR - http://www.sciencedirect.com/science/article/pii/S0257897210001106 ER - TY - Generic T1 - A comparison of boron hydride- and hydrocarbon-based thiol derivatives assembled on gold surfaces T2 - NSTI Nanotechnology Conference and Trade Show Y1 - 2008 A1 - Tomas Base A1 - Zdenek Bastl A1 - Michael G S Londesborough A1 - Jan Machacek JF - NSTI Nanotechnology Conference and Trade Show PB - NSTI CY - Boston, USA VL - 1 UR - http://www.nsti.org/procs/Nanotech2008v1/2/T35.902 ER - TY - Generic T1 - Carborane Thiol-modified Gold Surfaces. A Study and Comparison of Modified Cluster and Flat Surfaces T2 - 12th International Meeting on Boron Chemistry (IMEBORON-XII) Y1 - 2005 A1 - Tomas Base A1 - Zdenek Bastl A1 - Zbynek Plzak A1 - Tomas Grygar A1 - Jaromir Plesek A1 - Michael J Carr JF - 12th International Meeting on Boron Chemistry (IMEBORON-XII) CY - Sendai, Japan, 11 ER - TY - JOUR T1 - Carboranethiol-Modified Gold Surfaces. A Study and Comparison of Modified Cluster and Flat Surfaces JF - Langmuir Y1 - 2005 A1 - Tomas Base A1 - Zdenek Bastl A1 - Zbynek Plzak A1 - Tomas Grygar A1 - Jaromir Plesek A1 - Michael J Carr A1 - Vaclav Malina A1 - Jan Subrt A1 - Jaroslav Bohacek A1 - Eva Vecernikova A1 - Otomar Kriz AB -

Four different carboranethiol derivatives were used to modify the surfaces of gold nanoparticles and flat gold films. The novel materials engendered from these modifications are extraordinarily stable species with surfaces that support self-assembled monolayers of 1-(HS)-1,2-C2B10H11, 1,2-(HS)2-1,2-C2B10H10, 1,12-(HS)2-1,12-C2B10H10, and 9,12-(HS)2-1,2-C2B10H10, respectively. Surprisingly, characterization of these materials revealed that a number of molecules of the carboranethiol derivatives are incorporated inside the nanoparticles. This structural feature was studied using a number of techniques, including X-ray photoelectron spectroscopy (XPS), UV VL - 21 UR - http://pubs.acs.org/doi/abs/10.1021/la051122d IS - 17 ER -