@article {122, title = {Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces}, journal = {Langmuir}, volume = {28}, year = {2012}, chapter = {12518}, abstract = {

Two different positional isomers of 1,2-dicarbacloso-dodecaboranedithiols, 1,2-(HS)2-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been investigated as cluster building blocks for self-assembled monolayers (SAMs) on copper surfaces. These two isomers represent a convenient system in which the attachment of SH groups at different positions on the skeleton affects their acidic character and thus also determines their reactivity with a copper surface. Isomer 1 exhibited etching of polycrystalline Cu films, and a detailed investigation of the experimental conditions showed that both the acidic character of SH groups and the presence of oxygen at the copper surface play crucial roles in how the surface reaction proceeds: whether toward a self-assembled monolayer or toward copper film etching. We found that each positional isomer requires completely different conditions for the preparation of a SAM on copper surfaces. Optimized conditions for the former isomer required the exposure of a freshly prepared Cu surface to vapor of 1 in vacuum, which avoided the presence of oxygen and moisture. Adsorption from a dichloromethane solution afforded a sparsely covered Cu(0) surface; isomer 1 effectively removes the surface copper(I) oxide, forming a soluble product, but apparently binds only weakly to the clean Cu(0) surface. In contrast, adsorption of the latter, less volatile isomer proceeded better from a dichloromethane solution than from the vapor phase. Isomer 2 was even able to densely cover the copper surface cleaned up by the dichloromethane solution of 1. Both isomers exhibited high capacity to remove oxygen atoms from the surface copper(I) oxide that forms immediately after the exposure of freshly prepared copper films to ambient atmosphere. Isomer 2 showed suppression of Cu film oxidation. A number of methods including X-ray photoelectron spectroscopy (XPS), X-ray Rutherford back scattering (RBS), proton-induced X-ray emission (PIXE) analysis, atomic force microscopy (AFM), cyclic voltammetry, and contact angle measurements were used to investigate the experimental conditions for the preparation of SAMs of both positional isomers on copper surfaces and to shed light on the interaction between these molecules and a polycrystalline copper surface.

}, doi = {10.1021/la302334x}, url = {http://pubs.acs.org/doi/abs/10.1021\%2Fla302334x}, author = {Tomas Base and Zdenek Bastl and Vladimir Havranek and Jan Machacek and Jens Langecker and Vaclav Malina} } @proceedings {136, title = {Carboranethiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces, or a Novel Class of Etchants?}, journal = {European Materials Research Society, Spring Meeting}, year = {2012}, publisher = {E-MRS}, address = {Strasbourg, France, 2012 May 14-18}, abstract = {

This contribution aims at showing an unprecedented behavior of carboranedithiols on copper surfaces. Two different positional isomers of 1,2-dicarba-closo-dodecaborane-dithiol, 1,2-(HS)2-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been used as a convenient molecular system in which the attachment of -SH groups at different positions on the skeleton affects their acidic character and thus determines their reactivity with a copper surface. While the latter isomer represents a weak acid and forms a self-assembled monolayer (SAM) similarly to various aliphatic and aromatic thiols reported previously, the former isomer shows etching of copper leading to a complete dissolution of the films used in our experiments at a rate of approx. 70 nm per hour (in 7.5 mM EtOH solution of 1 at 20 C). A detailed investigation of the experimental conditions showed that the acidic character of -SH groups and the presence of oxygen at the copper surface play crucial role in how the surface reaction proceeds: whether towards the formation of a 1-SAM or towards etching and dissolution of a copper film. Reaction between 1 and a freshly prepared copper surface in vacuum or in a dry and oxygen-free solvent such as toluene, or dichloromethane yields a 1-SAM. This study shows the first thiol derivative that possesses the ability to etch copper films. A number of methods including XPS, RBS, PIXE have been used and the results will be presented and discussed. Acknowledgement: P205/10/0348, GACR

}, author = {Tomas Base and Zdenek Bastl and Vladimir Havranek and Jan Machacek and Vaclav Malina} } @article {117, title = {Carborane-thiol-silver interactions. A comparative study of the molecular protection of silver surfaces}, journal = {Surface and Coatings Technology}, volume = {204}, year = {2010}, chapter = {2639}, abstract = {

The interaction between flat silver surfaces and carboranethiol derivatives, and its relevance regarding the molecular protection of silver against corrosion by hydrogen sulphide, are reported here. A comparison of the protective qualities of four carboranethiols (1-HS-1,2-C2B10H11, 1,2-(HS)2-1,2-C2B10H10, 9,12-(HS)2-1,2-C2B10H10, and 1,12-(HS)2-1,2-C2B10H10) with several organic thiols (1-butanethiol, 1-octanethiol, 1-dodecanethiol, benzene-1,2-dithiol, benzenethiol, and sodium 2-mercaptoethanesulphonate) is provided. All these derivatives are categorized according to their capacity to inhibit the interaction of silver with H2S in the presence of water molecules in the gas phase. We found that significantly better molecular protection for silver surfaces is afforded by the carboranethiol derivatives, and, of these, 9,12-(HS)2-1,2-C2B10H10 proved to be particularly effective. The corrosion of silver by H2S is accompanied by well-defined colour changes from lustrous silver, through yellow, violet, blue, and finally to grey. This sequence has not been reported before and it is used in this study as a qualitative indicator of the extent of silver corrosion. Our results are supported by reflectance UV

}, doi = {10.1016/j.surfcoat.2010.02.019}, url = {http://www.sciencedirect.com/science/article/pii/S0257897210001106}, author = {Tomas Base and Zdenek Bastl and Vladimir Havranek and Kamil Lang and Jonathan Bould and Michael G S Londesborough and Jan Machacek and Jaromir Plesek} }