@article {122, title = {Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces}, journal = {Langmuir}, volume = {28}, year = {2012}, chapter = {12518}, abstract = {

Two different positional isomers of 1,2-dicarbacloso-dodecaboranedithiols, 1,2-(HS)2-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been investigated as cluster building blocks for self-assembled monolayers (SAMs) on copper surfaces. These two isomers represent a convenient system in which the attachment of SH groups at different positions on the skeleton affects their acidic character and thus also determines their reactivity with a copper surface. Isomer 1 exhibited etching of polycrystalline Cu films, and a detailed investigation of the experimental conditions showed that both the acidic character of SH groups and the presence of oxygen at the copper surface play crucial roles in how the surface reaction proceeds: whether toward a self-assembled monolayer or toward copper film etching. We found that each positional isomer requires completely different conditions for the preparation of a SAM on copper surfaces. Optimized conditions for the former isomer required the exposure of a freshly prepared Cu surface to vapor of 1 in vacuum, which avoided the presence of oxygen and moisture. Adsorption from a dichloromethane solution afforded a sparsely covered Cu(0) surface; isomer 1 effectively removes the surface copper(I) oxide, forming a soluble product, but apparently binds only weakly to the clean Cu(0) surface. In contrast, adsorption of the latter, less volatile isomer proceeded better from a dichloromethane solution than from the vapor phase. Isomer 2 was even able to densely cover the copper surface cleaned up by the dichloromethane solution of 1. Both isomers exhibited high capacity to remove oxygen atoms from the surface copper(I) oxide that forms immediately after the exposure of freshly prepared copper films to ambient atmosphere. Isomer 2 showed suppression of Cu film oxidation. A number of methods including X-ray photoelectron spectroscopy (XPS), X-ray Rutherford back scattering (RBS), proton-induced X-ray emission (PIXE) analysis, atomic force microscopy (AFM), cyclic voltammetry, and contact angle measurements were used to investigate the experimental conditions for the preparation of SAMs of both positional isomers on copper surfaces and to shed light on the interaction between these molecules and a polycrystalline copper surface.

}, doi = {10.1021/la302334x}, url = {http://pubs.acs.org/doi/abs/10.1021\%2Fla302334x}, author = {Tomas Base and Zdenek Bastl and Vladimir Havranek and Jan Machacek and Jens Langecker and Vaclav Malina} } @proceedings {136, title = {Carboranethiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces, or a Novel Class of Etchants?}, journal = {European Materials Research Society, Spring Meeting}, year = {2012}, publisher = {E-MRS}, address = {Strasbourg, France, 2012 May 14-18}, abstract = {

This contribution aims at showing an unprecedented behavior of carboranedithiols on copper surfaces. Two different positional isomers of 1,2-dicarba-closo-dodecaborane-dithiol, 1,2-(HS)2-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been used as a convenient molecular system in which the attachment of -SH groups at different positions on the skeleton affects their acidic character and thus determines their reactivity with a copper surface. While the latter isomer represents a weak acid and forms a self-assembled monolayer (SAM) similarly to various aliphatic and aromatic thiols reported previously, the former isomer shows etching of copper leading to a complete dissolution of the films used in our experiments at a rate of approx. 70 nm per hour (in 7.5 mM EtOH solution of 1 at 20 C). A detailed investigation of the experimental conditions showed that the acidic character of -SH groups and the presence of oxygen at the copper surface play crucial role in how the surface reaction proceeds: whether towards the formation of a 1-SAM or towards etching and dissolution of a copper film. Reaction between 1 and a freshly prepared copper surface in vacuum or in a dry and oxygen-free solvent such as toluene, or dichloromethane yields a 1-SAM. This study shows the first thiol derivative that possesses the ability to etch copper films. A number of methods including XPS, RBS, PIXE have been used and the results will be presented and discussed. Acknowledgement: P205/10/0348, GACR

}, author = {Tomas Base and Zdenek Bastl and Vladimir Havranek and Jan Machacek and Vaclav Malina} } @article {115, title = {Carboranethiol-Modified Gold Surfaces. A Study and Comparison of Modified Cluster and Flat Surfaces}, journal = {Langmuir}, volume = {21}, year = {2005}, chapter = {7776}, abstract = {

Four different carboranethiol derivatives were used to modify the surfaces of gold nanoparticles and flat gold films. The novel materials engendered from these modifications are extraordinarily stable species with surfaces that support self-assembled monolayers of 1-(HS)-1,2-C2B10H11, 1,2-(HS)2-1,2-C2B10H10, 1,12-(HS)2-1,12-C2B10H10, and 9,12-(HS)2-1,2-C2B10H10, respectively. Surprisingly, characterization of these materials revealed that a number of molecules of the carboranethiol derivatives are incorporated inside the nanoparticles. This structural feature was studied using a number of techniques, including X-ray photoelectron spectroscopy (XPS), UV }, doi = {10.1021/la051122d}, url = {http://pubs.acs.org/doi/abs/10.1021/la051122d}, author = {Tomas Base and Zdenek Bastl and Zbynek Plzak and Tomas Grygar and Jaromir Plesek and Michael J Carr and Vaclav Malina and Jan Subrt and Jaroslav Bohacek and Eva Vecernikova and Otomar Kriz} }